Tungsten Electrode thiab tungsten koob Homology thiab txawv txoj kev hauv kev lag luam Advanced

Nyob rau hauv siab -tech industrial manufacturing, Tungsten (Tungsten) tau dhau los ua qhov kev xaiv zoo tshaj plaws rau kev tswj "them nqi thiab lub zog" nrog nws qhov melting point txog li 3422℃thiab zoo heev electron emission efficiency. Txawm li cas los xij, hauv European thiab Asmeskas B2B kev yuav khoom thiab tsim qauv engineering, Tungsten Electrodes thiab Tungsten Koob, ob nqe lus zoo sib xws, feem ntau ua rau cov thawj coj yuav khoom tsis meej nrog cov keeb kwm yav dhau los.

Txawm hais tias lawv sib koom tib yam refractory hlau noob, nyob rau hauv cov nqe lus ntawm tus nqi tso tawm mechanism, geometric topology, thiab kev lag luam daim ntawv thov ciam teb, ob yog staging ib tug ntoo khaub lig- ciam teb lus dab neeg ntawm "ib tug dominates lub macro zog, thiab ib tug carves lub microcosm".

I. Core commonality: refractory matrix thiab huab crushing ntawm electron spillover ua hauj lwm

Raws li cov ntaub ntawv homologous, siab -kev ua tau zoo tungsten electrodes thiab tungsten koob muaj peb qhov sib txawv tsis sib xws hauv cov thev naus laus zis:

Txwv tsis pub thermal electron emission muaj peev xwm: Ob qho tib si vuam arc thiab semiconductor sojntsuam cia siab rau tungsten qhov tsis tshua muaj hluav taws xob tawg ua haujlwm ntawm qhov kub thiab txias lossis qhov chaw siab.

Lub ntiaj teb tsis tshua muaj -doped crystalline hloov kho: Txhawm rau txhim kho electron emission efficiency thiab ua kom lub neej ntev, ob leeg siv dav siv thev naus laus zis hauv ntiaj teb oxide doping, xws li thorium-tungsten (Th-W), cerium-tungsten (Ce-W), -} lanthanum{6} thiab lanthanum yttrium-tungsten (Y-W), txhawm rau txhawm rau siab -kub creep los ntawm kev hloov pauv nplej.

Tsis tshua muaj siab tiv thaiv arc yaig: Hauv lub xeev dawb - kub ua hauj lwm, ob qho tib si yuav tsum tau muaj qhov ruaj khov geometry los xyuas kom meej qhov txuas ntxiv ntawm qhov ceev tam sim no.

II. Deep divergence: qhov tawg ntawm macro "plasma heat transfer" thiab micro "field emission"

Dab tsi ua rau cov txheej txheem engineers ua qhov sib txawv hnyav thaum xaiv cov qauv yog qhov sib txawv tseem ceeb hauv lub cev lub cev ntawm ob:

1. Tungsten electrodes: lub "zog totem" ntawm macroscopic plasma arcs

Tungsten electrodes feem ntau muaj txoj kab uas hla loj (feem ntau yog 1.0 hli -6.4 hli) thiab lawv lub kaum sab xis ntawm lub khob hliav qab yog txhob txwm tswj (feem ntau yog 30℃-60 degree), tso cai rau cov arc sib sau ua ke hauv ib cheeb tsam.

Lub cev tseem ceeb: Nws ua lub luag haujlwm ntawm cov khoom thauj tam sim no thiab cov ntshav plasma, tsom mus rau kev tso tawm siab - lub zog hluav taws xob.

Unmentioned cutting-ntug-thermal spraying (Plaa Spraying): Thaum txau hnav-resistant thermal barrier coatings (TBCs) ntawm cav hniav, cov tub ntxhais ntawm ultra- siab- zog plasma spray phom yog qhov loj - txoj kab uas hla} thoriumtung{6} electrode. Nws yuav tsum tiv taus ntau txhiab amperes ntawm tam sim no rau cov sij hawm kawg, ionizing cov pa rau hauv cov plasma kwj ze rau 10,000 degree.

2. Tungsten koob: "Precision solution scale" ntawm microscopic chaw hluav taws xob teb

tungsten koob yog tshwj xeeb muaj nyob rau ntawm nano lossis micron qib. Lub taub hau yog feem ntau electrochemically polished, thiab curvature vojvoog ntawm lub ntsis tuaj yeem ncav cuag 0.1 μm-10 μm.

Lub cev lub cev: Nws siv lub hauv paus ntsiab lus ntawm microscopic tip discharge (Field Emission). Ntawm qhov tsis tshua muaj hluav taws xob tsawg, lub vojvoog me me me tuaj yeem tsim cov hluav taws xob hauv zos txaus ntshai, ua rau cov hluav taws xob ncaj qha "tunnel" thiab dhau mus.

Unmentioned cutting-ntug teb-semiconductor Wafer Probing (Wafer Probing) thiab electrostatic tshem tawm (ESD): Hauv kev ntsuas hluav taws xob ua ntej lub wafer tsis ntim, ultra-zoo thiab siab-hardness tungsten koob (lossis tungsten} siv cov khoom siv hluav taws xob ncaj qha) yog siv cov khoom siv tungsten ncaj qha {{4}. pad (Bond Pad); Nyob rau tib lub sijhawm, nyob rau hauv semiconductor ultra- chav huv huv, ib rab koob tshwj xeeb tungsten yog siv los ua lub koob tseem ceeb ntawm ionizer, tso siab -voltage tsub kom neutralize kab hluav taws xob zoo li qub hauv huab cua.

Kev kho mob pem hauv ntej-Ultra-mob tsawg kawg nkaus siab- zaus hluav taws xob riam (Electrosurgical Needles): Hauv kev phais mob hlwb thiab kho qhov muag, ultra- koob tungsten zoo yog siv siab - zaus hluav taws xob riam taub hau. Using the extremely high current density of its microscopic tip, "instant carbonization and hemostasis of the incision" can be achieved, and the adhesion and thermal damage to the surrounding healthy tissues are almost zero.

III. Core xaiv thiab txheej txheem sib piv matrix